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Compact Ga2O3 Thin Films Deposited by Plasma Enhanced Atomic Layer Deposition at Low Temperature.
Nanomaterials (Basel). 2022 Apr 29;12(9):1510. doi: 10.3390/nano12091510.
Nanomaterials (Basel). 2022.
PMID: 35564219
Free PMC article.
Deposition and Characterization of RP-ALD SiO2 Thin Films with Different Oxygen Plasma Powers.
Zhang XY, Yang Y, Zhang ZX, Geng XP, Hsu CH, Wu WY, Lien SY, Zhu WZ.
Zhang XY, et al.
Nanomaterials (Basel). 2021 Apr 29;11(5):1173. doi: 10.3390/nano11051173.
Nanomaterials (Basel). 2021.
PMID: 33947065
Free PMC article.
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