In this work the authors discussed the fabrication of NbN thin films deposited using two methods: reactive magnetron sputtering system and DC bias-voltage sputtering system. The thickness and the surface morphology of the thin films were measured and observed by SEM. The crystalloid structure was analyzed by X-ray diffraction (XRD). The authors also measured the critical temperature (Tc) of the thin films. The authors compared the characters of NbN thin films that the authors prepared through two methods. The results showed that the films the authors prepared were uniform, compact, well constructed and sing-phase FCC delta-NbN. It is shown that the deposition temperature and the flux of N2 have a strong effect on the preferred orientation, while the critical temperature of the films is influenced by the quality of the original vacuum.