Area-selective atomic layer deposition on 2D monolayer lateral superlattices.
Park J, Kwak SJ, Kang S, Oh S, Shin B, Noh G, Kim TS, Kim C, Park H, Oh SH, Kang W, Hur N, Chai HJ, Kang M, Kwon S, Lee J, Lee Y, Moon E, Shi C, Lou J, Lee WB, Kwak JY, Yang H, Chung TM, Eom T, Suh J, Han Y, Jeong HY, Kim Y, Kang K.
Park J, et al.
Nat Commun. 2024 Mar 8;15(1):2138. doi: 10.1038/s41467-024-46293-w.
Nat Commun. 2024.
PMID: 38459015
Free PMC article.
In this study, we report a superlattice-based AS-ALD (SAS-ALD) process using a two-dimensional (2D) MoS(2)-MoSe(2) lateral superlattice as a pre-defining template. We achieved a minimum half pitch size of a sub-10 nm scale for the resulting AS-ALD on the 2D superlattice te …
In this study, we report a superlattice-based AS-ALD (SAS-ALD) process using a two-dimensional (2D) MoS(2)-MoSe(2) lateral superlattice as a …