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Page 1
Microstructures of HfOx Films Prepared via Atomic Layer Deposition Using La(NO3)3·6H2O Oxidants.
Materials (Basel). 2021 Dec 6;14(23):7478. doi: 10.3390/ma14237478.
Materials (Basel). 2021.
PMID: 34885632
Free PMC article.
Low Temperature Thermal Atomic Layer Deposition of Aluminum Nitride Using Hydrazine as the Nitrogen Source.
Jung YC, Hwang SM, Le DN, Kondusamy ALN, Mohan J, Kim SW, Kim JH, Lucero AT, Ravichandran A, Kim HS, Kim SJ, Choi R, Ahn J, Alvarez D, Spiegelman J, Kim J.
Jung YC, et al.
Materials (Basel). 2020 Jul 31;13(15):3387. doi: 10.3390/ma13153387.
Materials (Basel). 2020.
PMID: 32751836
Free PMC article.
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Resistive Switching Characteristics of Atomic-Layer-Deposited Y2O3 Insulators with Deposition Temperature.
Jung YC, Seong S, Lee T, Park IS, Ahn J.
Jung YC, et al.
J Nanosci Nanotechnol. 2015 Oct;15(10):7586-9. doi: 10.1166/jnn.2015.11163.
J Nanosci Nanotechnol. 2015.
PMID: 26726377
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A Comprehensive Study on the Effect of TiN Top and Bottom Electrodes on Atomic Layer Deposited Ferroelectric Hf0.5Zr0.5O2 Thin Films.
Kim SJ, Mohan J, Kim HS, Hwang SM, Kim N, Jung YC, Sahota A, Kim K, Yu HY, Cha PR, Young CD, Choi R, Ahn J, Kim J.
Kim SJ, et al. Among authors: jung yc.
Materials (Basel). 2020 Jul 2;13(13):2968. doi: 10.3390/ma13132968.
Materials (Basel). 2020.
PMID: 32630791
Free PMC article.
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