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yi shao kui
(8 results)?
EUV scatterometer with a high-harmonic-generation EUV source.
Opt Express. 2016 Nov 28;24(24):28014-28025. doi: 10.1364/OE.24.028014.
Opt Express. 2016.
PMID: 27906368
Free article.
Reflectometer-based metrology for high-aspect ratio via measurement.
Ku YS, Yang FS.
Ku YS, et al.
Opt Express. 2010 Mar 29;18(7):7269-80. doi: 10.1364/OE.18.007269.
Opt Express. 2010.
PMID: 20389748
Free article.
Item in Clipboard
Infrared differential interference contrast microscopy for 3D interconnect overlay metrology.
Ku YS, Shyu DM, Lin YS, Cho CH.
Ku YS, et al.
Opt Express. 2013 Aug 12;21(16):18884-98. doi: 10.1364/OE.21.018884.
Opt Express. 2013.
PMID: 23938801
Free article.
Item in Clipboard
Characterization of high density through silicon vias with spectral reflectometry.
Ku YS, Huang KC, Hsu W.
Ku YS, et al.
Opt Express. 2011 Mar 28;19(7):5993-6006. doi: 10.1364/OE.19.005993.
Opt Express. 2011.
PMID: 21451624
Free article.
Item in Clipboard
Overlay measurement using angular scatterometer for the capability of integrated metrology.
Ko CH, Ku YS.
Ko CH, et al. Among authors: ku ys.
Opt Express. 2006 Jun 26;14(13):6001-10. doi: 10.1364/oe.14.006001.
Opt Express. 2006.
PMID: 19516771
Free article.
Item in Clipboard
Through-focus technique for nano-scale grating pitch and linewidth analysis.
Ku YS, Liu AS, Smith N.
Ku YS, et al.
Opt Express. 2005 Sep 5;13(18):6699-708. doi: 10.1364/opex.13.006699.
Opt Express. 2005.
PMID: 19498687
Free article.
Item in Clipboard
Scatterometry-based metrology with feature region signatures matching.
Ku YS, Wang SC, Shyu DM, Smith N.
Ku YS, et al.
Opt Express. 2006 Sep 18;14(19):8482-91. doi: 10.1364/oe.14.008482.
Opt Express. 2006.
PMID: 19529226
Free article.
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