The Fraunhofer Institute for Photonic Microsystems (IPMS) has been developing and manufacturing micromirror arrays for more than 20 years. While originally focusing on applications related to microlithography and therefore mainly for light in the deep ultraviolet range, the range of applications has been expanded since, including applications in the visible and near-infrared range. This paper gives an overview of the devices and their designs, fabrication, and characterization.
Keywords: image generation; microlithography; micromirror arrays; microscopy; wavefront shaping.