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Page 1
Electrical and Physical Characteristics of WO₃/Ag/WO₃ Sandwich Structure Fabricated with Magnetic-Control Sputtering Metrology †.
Sensors (Basel). 2018 Aug 25;18(9):2803. doi: 10.3390/s18092803.
Sensors (Basel). 2018.
PMID: 30149633
Free PMC article.
Teflon/SiO₂ Bilayer Passivation for Improving the Electrical Reliability of Oxide TFTs Fabricated Using a New Two-Photomask Self-Alignment Process.
Fan CL, Shang MC, Li BJ, Lin YZ, Wang SJ, Lee WD, Hung BR.
Fan CL, et al. Among authors: wang sj.
Materials (Basel). 2015 Apr 13;8(4):1704-1713. doi: 10.3390/ma8041704.
Materials (Basel). 2015.
PMID: 28788026
Free PMC article.
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Investigation of Rapid Low-Power Microwave-Induction Heating Scheme on the Cross-Linking Process of the Poly(4-vinylphenol) for the Gate Insulator of Pentacene-Based Thin-Film Transistors.
Fan CL, Shang MC, Wang SJ, Hsia MY, Lee WD, Huang BR.
Fan CL, et al. Among authors: wang sj.
Materials (Basel). 2017 Jul 3;10(7):742. doi: 10.3390/ma10070742.
Materials (Basel). 2017.
PMID: 28773101
Free PMC article.
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High-performance III-V MOSFET with nano-stacked high-k gate dielectric and 3D fin-shaped structure.
Chen SH, Liao WS, Yang HC, Wang SJ, Liaw YG, Wang H, Gu H, Wang MC.
Chen SH, et al. Among authors: wang sj.
Nanoscale Res Lett. 2012 Aug 1;7(1):431. doi: 10.1186/1556-276X-7-431.
Nanoscale Res Lett. 2012.
PMID: 22853458
Free PMC article.
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A Self-Aligned a-IGZO Thin-Film Transistor Using a New Two-Photo-Mask Process with a Continuous Etching Scheme.
Fan CL, Shang MC, Li BJ, Lin YZ, Wang SJ, Lee WD.
Fan CL, et al. Among authors: wang sj.
Materials (Basel). 2014 Aug 11;7(8):5761-5768. doi: 10.3390/ma7085761.
Materials (Basel). 2014.
PMID: 28788159
Free PMC article.
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