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MOS Capacitance Measurements for PEALD TiO2 Dielectric Films Grown under Different Conditions and the Impact of Al2O3 Partial-Monolayer Insertion.
Nanomaterials (Basel). 2020 Feb 17;10(2):338. doi: 10.3390/nano10020338.
Nanomaterials (Basel). 2020.
PMID: 32079219
Free PMC article.
Process Oxygen Flow Influence on the Structural Properties of Thin Films Obtained by Co-Sputtering of (TeO2)x-ZnO and Au onto Si Substrates.
Bontempo L, Dos Santos Filho SG, Kassab LRP.
Bontempo L, et al. Among authors: dos santos filho sg.
Nanomaterials (Basel). 2020 Sep 17;10(9):1863. doi: 10.3390/nano10091863.
Nanomaterials (Basel). 2020.
PMID: 32957593
Free PMC article.
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