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Year | Number of Results |
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2013 | 1 |
2016 | 1 |
2018 | 1 |
2019 | 1 |
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2023 | 1 |
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Page 1
The state of zinc in methanol synthesis over a Zn/ZnO/Cu(211) model catalyst.
Science. 2022 May 6;376(6593):603-608. doi: 10.1126/science.abj7747. Epub 2022 May 5.
Science. 2022.
PMID: 35511988
A laboratory-based multifunctional near ambient pressure X-ray photoelectron spectroscopy system for electrochemical, catalytic, and cryogenic studies.
Haug L, Griesser C, Thurner CW, Winkler D, Moser T, Thaler M, Bartl P, Rainer M, Portenkirchner E, Schumacher D, Dierschke K, Köpfle N, Penner S, Beyer MK, Loerting T, Kunze-Liebhäuser J, Klötzer B.
Haug L, et al. Among authors: kopfle n.
Rev Sci Instrum. 2023 Jun 1;94(6):065104. doi: 10.1063/5.0151755.
Rev Sci Instrum. 2023.
PMID: 37862508
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Crystallographic and electronic evolution of lanthanum strontium ferrite (La0.6Sr0.4FeO3-δ) thin film and bulk model systems during iron exsolution.
Götsch T , Köpfle N , Grünbacher M , Bernardi J , Carbonio EA , Hävecker M , Knop-Gericke A , Bekheet MF , Schlicker L , Doran A , Gurlo A , Franz A , Klötzer B , Penner S .
Götsch T , et al. Among authors: kopfle n.
Phys Chem Chem Phys. 2019 Feb 13;21(7):3781-3794. doi: 10.1039/c8cp07743f.
Phys Chem Chem Phys. 2019.
PMID: 30707216
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Chemical vapor deposition-prepared sub-nanometer Zr clusters on Pd surfaces: promotion of methane dry reforming.
Mayr L, Shi XR, Köpfle N, Milligan CA, Zemlyanov DY, Knop-Gericke A, Hävecker M, Klötzer B, Penner S.
Mayr L, et al. Among authors: kopfle n.
Phys Chem Chem Phys. 2016 Nov 23;18(46):31586-31599. doi: 10.1039/c6cp07197j.
Phys Chem Chem Phys. 2016.
PMID: 27834976
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Zirconium-Assisted Activation of Palladium To Boost Syngas Production by Methane Dry Reforming.
Köpfle N, Götsch T, Grünbacher M, Carbonio EA, Hävecker M, Knop-Gericke A, Schlicker L, Doran A, Kober D, Gurlo A, Penner S, Klötzer B.
Köpfle N, et al.
Angew Chem Int Ed Engl. 2018 Oct 26;57(44):14613-14618. doi: 10.1002/anie.201807463. Epub 2018 Sep 17.
Angew Chem Int Ed Engl. 2018.
PMID: 30179293
Free PMC article.
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An (ultra) high-vacuum compatible sputter source for oxide thin film growth.
Mayr L, Köpfle N, Auer A, Klötzer B, Penner S.
Mayr L, et al. Among authors: kopfle n.
Rev Sci Instrum. 2013 Sep;84(9):094103. doi: 10.1063/1.4821148.
Rev Sci Instrum. 2013.
PMID: 24089841
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