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Page 1
Resist Filling Study for UV Nanoimprint Lithography Using Stamps with Various Micro/Nano Ratios.
Micromachines (Basel). 2018 Jul 2;9(7):335. doi: 10.3390/mi9070335.
Micromachines (Basel). 2018.
PMID: 30424268
Free PMC article.
High Aspect Ratio Nanoimprint Mold-Cavity Filling and Stress Simulation Based on Finite-Element Analysis.
Sun H, Yin M, Wang H.
Sun H, et al. Among authors: yin m.
Micromachines (Basel). 2017 Aug 6;8(8):243. doi: 10.3390/mi8080243.
Micromachines (Basel). 2017.
PMID: 30400434
Free PMC article.
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