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Year | Number of Results |
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2016 | 1 |
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Page 1
Controlled Layer-by-Layer Etching of MoS₂.
ACS Appl Mater Interfaces. 2015 Jul 29;7(29):15892-7. doi: 10.1021/acsami.5b03491. Epub 2015 Jul 14.
ACS Appl Mater Interfaces. 2015.
PMID: 26091282
Atomic Layer Etching Using a Novel Radical Generation Module.
Jung J, Kim K.
Jung J, et al. Among authors: kim k.
Materials (Basel). 2023 May 9;16(10):3611. doi: 10.3390/ma16103611.
Materials (Basel). 2023.
PMID: 37241238
Free PMC article.
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Etch characteristics of Si and TiO2 nanostructures using pulse biased inductively coupled plasmas.
Kim SG, Yang KC, Shin YJ, Kim KN, Kim DW, Lee JY, Kim Y, Yeom GY.
Kim SG, et al.
Nanotechnology. 2020 Apr 9;31(26):265302. doi: 10.1088/1361-6528/ab7c75. Epub 2020 Mar 4.
Nanotechnology. 2020.
PMID: 32131063
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Improvement of a block co-polymer (PS-b-PMMA)-masked silicon etch profile using a neutral beam.
Yun D, Park J, Kim H, Mun J, Kim S, Kim K, Yeom G.
Yun D, et al. Among authors: kim k.
Nanotechnology. 2016 Sep 23;27(38):384002. doi: 10.1088/0957-4484/27/38/384002. Epub 2016 Aug 16.
Nanotechnology. 2016.
PMID: 27528588
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