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Characterization of SiO2 Etching Profiles in Pulse-Modulated Capacitively Coupled Plasmas.
Materials (Basel). 2021 Sep 3;14(17):5036. doi: 10.3390/ma14175036.
Materials (Basel). 2021.
PMID: 34501123
Free PMC article.
Cutoff probe using Fourier analysis for electron density measurement.
Na BK, You KH, Kim DW, Chang HY, You SJ, Kim JH.
Na BK, et al.
Rev Sci Instrum. 2012 Jan;83(1):013510. doi: 10.1063/1.3680103.
Rev Sci Instrum. 2012.
PMID: 22299954
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