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Page 1
Atomic Layer Deposition of Layered Boron Nitride for Large-Area 2D Electronics.
ACS Appl Mater Interfaces. 2020 Aug 12;12(32):36688-36694. doi: 10.1021/acsami.0c07548. Epub 2020 Jul 29.
ACS Appl Mater Interfaces. 2020.
PMID: 32667778
Low Temperature Thermal Atomic Layer Deposition of Aluminum Nitride Using Hydrazine as the Nitrogen Source.
Jung YC, Hwang SM, Le DN, Kondusamy ALN, Mohan J, Kim SW, Kim JH, Lucero AT, Ravichandran A, Kim HS, Kim SJ, Choi R, Ahn J, Alvarez D, Spiegelman J, Kim J.
Jung YC, et al. Among authors: mohan j.
Materials (Basel). 2020 Jul 31;13(15):3387. doi: 10.3390/ma13153387.
Materials (Basel). 2020.
PMID: 32751836
Free PMC article.
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A Comprehensive Study on the Effect of TiN Top and Bottom Electrodes on Atomic Layer Deposited Ferroelectric Hf0.5Zr0.5O2 Thin Films.
Kim SJ, Mohan J, Kim HS, Hwang SM, Kim N, Jung YC, Sahota A, Kim K, Yu HY, Cha PR, Young CD, Choi R, Ahn J, Kim J.
Kim SJ, et al. Among authors: mohan j.
Materials (Basel). 2020 Jul 2;13(13):2968. doi: 10.3390/ma13132968.
Materials (Basel). 2020.
PMID: 32630791
Free PMC article.
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Stress-Induced Crystallization of Thin Hf1- XZr XO2 Films: The Origin of Enhanced Energy Density with Minimized Energy Loss for Lead-Free Electrostatic Energy Storage Applications.
Kim SJ, Mohan J, Lee JS, Kim HS, Lee J, Young CD, Colombo L, Summerfelt SR, San T, Kim J.
Kim SJ, et al. Among authors: mohan j.
ACS Appl Mater Interfaces. 2019 Feb 6;11(5):5208-5214. doi: 10.1021/acsami.8b17211. Epub 2019 Jan 28.
ACS Appl Mater Interfaces. 2019.
PMID: 30652846
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