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Year | Number of Results |
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2020 | 1 |
2021 | 1 |
2022 | 2 |
2023 | 3 |
2024 | 0 |
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Page 1
Programmable Nanoscale Crack Lithography for Multiscale PMMA Patterns.
ACS Appl Mater Interfaces. 2023 Jun 14;15(23):28349-28357. doi: 10.1021/acsami.3c02625. Epub 2023 May 31.
ACS Appl Mater Interfaces. 2023.
PMID: 37256651
Dry-Transferable Photoresist Enabled Reliable Conformal Patterning for Ultrathin Flexible Electronics.
Chen L, Liu P, Feng B, Shu Z, Liang H, Chen Y, Dong X, Xie J, Duan H.
Chen L, et al. Among authors: liang h.
Adv Mater. 2023 Sep;35(38):e2303513. doi: 10.1002/adma.202303513. Epub 2023 Jul 25.
Adv Mater. 2023.
PMID: 37289041
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Fabrication of single-nanometer metallic gaps via spontaneous nanoscale dewetting.
Zeng P, Shu Z, Zhang S, Liang H, Zhou Y, Ba D, Feng Z, Zheng M, Wu J, Chen Y, Duan H.
Zeng P, et al. Among authors: liang h.
Nanotechnology. 2021 May 14;32(20):205302. doi: 10.1088/1361-6528/abe576.
Nanotechnology. 2021.
PMID: 33571970
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Wafer-Level Highly Dense Metallic Nanopillar-Enabled High-Performance SERS Substrates for Molecular Detection.
Zeng P, Zheng M, Chen H, Chen G, Shu Z, Chen L, Liang H, Zhou Y, Zhao Q, Duan H.
Zeng P, et al. Among authors: liang h.
Nanomaterials (Basel). 2023 May 25;13(11):1733. doi: 10.3390/nano13111733.
Nanomaterials (Basel). 2023.
PMID: 37299638
Free PMC article.
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Asymmetric Nanofractures Determined the Nonreciprocal Peeling for Self-Aligned Heterostructure Nanogaps and Devices.
Shu Z, Chen Y, Feng Z, Liang H, Li W, Liu Y, Duan H.
Shu Z, et al. Among authors: liang h.
ACS Appl Mater Interfaces. 2022 Jan 12;14(1):1718-1726. doi: 10.1021/acsami.1c19776. Epub 2022 Jan 2.
ACS Appl Mater Interfaces. 2022.
PMID: 34978176
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Suspended 3D metallic dimers with sub-10 nm gap for high-sensitive SERS detection.
Zeng P, Zhou Y, Shu Z, Liang H, Zhang X, Chen Y, Duan H, Zheng M.
Zeng P, et al. Among authors: liang h.
Nanotechnology. 2022 Dec 16;34(9). doi: 10.1088/1361-6528/aca338.
Nanotechnology. 2022.
PMID: 36384034
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Development of a symmetrical micro-beam minimizing horizontal drift for indentation and scratch.
Shi P, Liang H, Yan W, Sun J, Chen L, Qian L.
Shi P, et al. Among authors: liang h.
Rev Sci Instrum. 2020 Apr 1;91(4):043702. doi: 10.1063/1.5140523.
Rev Sci Instrum. 2020.
PMID: 32357735
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