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Did you mean hongqi qin (8 results)?
Controlled MoS₂ layer etching using CF₄ plasma.
Jeon MH, Ahn C, Kim H, Kim KN, LiN TZ, Qin H, Kim Y, Lee S, Kim T, Yeom GY. Jeon MH, et al. Among authors: qin h. Nanotechnology. 2015 Sep 4;26(35):355706. doi: 10.1088/0957-4484/26/35/355706. Epub 2015 Aug 12. Nanotechnology. 2015. PMID: 26267409