A Review: Preparation, Performance, and Applications of Silicon Oxynitride Film

Yue Shi; Liang He; Fangcao Guang; Luhai Li; Zhiqing Xin; Ruping Liu

doi:10.3390/mi10080552

A Review: Preparation, Performance, and Applications of Silicon Oxynitride Film

Micromachines (Basel). 2019 Aug 20;10(8):552. doi: 10.3390/mi10080552.

Authors

Yue Shi¹, Liang He², Fangcao Guang¹, Luhai Li¹, Zhiqing Xin¹, Ruping Liu³

Affiliations

¹ School of Printing and Packaging Engineering, Beijing Institute of Graphic Communication, Beijing 102600, China.
² State Key Laboratory of Advanced Technology for Materials Synthesis and Processing, Wuhan University of Technology, Wuhan 430070, China.
³ School of Printing and Packaging Engineering, Beijing Institute of Graphic Communication, Beijing 102600, China. liuruping@bigc.edu.cn.

Abstract

Silicon oxynitride (SiN_xO_y) is a highly promising functional material for its luminescence performance and tunable refractive index, which has wide applications in optical devices, non-volatile memory, barrier layer, and scratch-resistant coatings. This review presents recent developments, and discusses the preparation methods, performance, and applications of SiN_xO_y film. In particular, the preparation of SiN_xO_y film by chemical vapor deposition, physical vapor deposition, and oxynitridation is elaborated in details.

Keywords: chemical vapor deposition; photoluminescence; physical vapor deposition; silicon oxynitride; thin film.

Publication types

Review

Abstract

Publication types

Grants and funding