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Sequential Infiltration Synthesis into Maltoheptaose and Poly(styrene): Implications for Sub-10 nm Pattern Transfer.
Polymers (Basel). 2022 Feb 10;14(4):654. doi: 10.3390/polym14040654.
Polymers (Basel). 2022.
PMID: 35215576
Free PMC article.
Poly(styrene)-block-Maltoheptaose Films for Sub-10 nm Pattern Transfer: Implications for Transistor Fabrication.
Löfstrand A, Jafari Jam R, Mothander K, Nylander T, Mumtaz M, Vorobiev A, Chen WC, Borsali R, Maximov I.
Löfstrand A, et al.
ACS Appl Nano Mater. 2021 May 28;4(5):5141-5151. doi: 10.1021/acsanm.1c00582. Epub 2021 May 13.
ACS Appl Nano Mater. 2021.
PMID: 34308267
Free PMC article.
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Feature size control using surface reconstruction temperature in block copolymer lithography for InAs nanowire growth.
Löfstrand A, Svensson J, Wernersson LE, Maximov I.
Löfstrand A, et al.
Nanotechnology. 2020 Aug 7;31(32):325303. doi: 10.1088/1361-6528/ab8cef. Epub 2020 Apr 24.
Nanotechnology. 2020.
PMID: 32330916
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