Search Page
Save citations to file
Email citations
Send citations to clipboard
Add to Collections
Add to My Bibliography
Create a file for external citation management software
Your saved search
Your RSS Feed
Search Results
3 results
Filters applied: . Clear all
Results are displayed in a computed author sort order.
The Results By Year timeline is not available.
Page 1
Low-k SiOx/AlOx Nanolaminate Dielectric on Dielectric Achieved by Hybrid Pulsed Chemical Vapor Deposition.
ACS Appl Mater Interfaces. 2023 Dec 6;15(48):56556-56566. doi: 10.1021/acsami.3c13973. Epub 2023 Nov 18.
ACS Appl Mater Interfaces. 2023.
PMID: 37978920
Dielectric-on-Dielectric Achieved on SiO2 in Preference to W by Water-free Chemical Vapor Depositions with Aniline Passivation.
Huang J, Cho Y, Wang V, Zhang Z, Mu J, Yadav A, Wong K, Nemani S, Yieh E, Andrew K.
Huang J, et al. Among authors: yieh e.
ACS Appl Mater Interfaces. 2023 May 31;15(21):26128-26137. doi: 10.1021/acsami.3c02278. Epub 2023 May 19.
ACS Appl Mater Interfaces. 2023.
PMID: 37205770
Item in Clipboard
Selective Pulsed Chemical Vapor Deposition of Water-Free TiO2/Al2O3 and HfO2/Al2O3 Nanolaminates on Si and SiO2 in Preference to SiCOH.
Huang J, Cho Y, Zhang Z, Jan A, Wong KT, Nemani SD, Yieh E, Kummel AC.
Huang J, et al. Among authors: yieh e.
ACS Appl Mater Interfaces. 2022 Apr 6;14(13):15716-15727. doi: 10.1021/acsami.1c19810. Epub 2022 Mar 22.
ACS Appl Mater Interfaces. 2022.
PMID: 35316031
Item in Clipboard
Cite
Cite