Low-k SiOx/AlOx Nanolaminate Dielectric on Dielectric Achieved by Hybrid Pulsed Chemical Vapor Deposition.
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Huang J, et al. Among authors: winter c.
ACS Appl Mater Interfaces. 2023 Dec 6;15(48):56556-56566. doi: 10.1021/acsami.3c13973. Epub 2023 Nov 18.
ACS Appl Mater Interfaces. 2023.
PMID: 37978920