Teplyakov AV - Search Results

1

Selection Criteria for Small-Molecule Inhibitors in Area-Selective Atomic Layer Deposition: Fundamental Surface Chemistry Considerations.

Mameli A, Teplyakov AV. Mameli A, et al. Among authors: teplyakov av. Acc Chem Res. 2023 Aug 1;56(15):2084-2095. doi: 10.1021/acs.accounts.3c00221. Epub 2023 Jul 18. Acc Chem Res. 2023. PMID: 37463289

2

Deposition of copper from Cu(i) and Cu(ii) precursors onto HOPG surface: Role of surface defects and choice of a precursor.

Duan Y, Teplyakov AV. Duan Y, et al. Among authors: teplyakov av. J Chem Phys. 2017 Feb 7;146(5):052814. doi: 10.1063/1.4971287. J Chem Phys. 2017. PMID: 28178799 Free PMC article.

3

The Chemistry of Inorganic Precursors during the Chemical Deposition of Films on Solid Surfaces.

Barry ST, Teplyakov AV, Zaera F. Barry ST, et al. Among authors: teplyakov av. Acc Chem Res. 2018 Mar 20;51(3):800-809. doi: 10.1021/acs.accounts.8b00012. Epub 2018 Feb 28. Acc Chem Res. 2018. PMID: 29489341

4

Spectroscopic evidence for hydrogen diffusion through a several-nanometers-thick titanium carbonitride layer on silicon.

Bocharov S, Teplyakov AV. Bocharov S, et al. Among authors: teplyakov av. J Am Chem Soc. 2003 Jun 18;125(24):7196-7. doi: 10.1021/ja035026f. J Am Chem Soc. 2003. PMID: 12797791

5

Azide reactions for controlling clean silicon surface chemistry: benzylazide on Si(100)-2 x 1.

Bocharov S, Dmitrenko O, Méndez De Leo LP, Teplyakov AV. Bocharov S, et al. Among authors: teplyakov av. J Am Chem Soc. 2006 Jul 26;128(29):9300-1. doi: 10.1021/ja0623663. J Am Chem Soc. 2006. PMID: 16848443

6

-NH- termination of the Si(111) surface by wet chemistry.

Tian F, Taber DF, Teplyakov AV. Tian F, et al. Among authors: teplyakov av. J Am Chem Soc. 2011 Dec 28;133(51):20769-77. doi: 10.1021/ja205140h. Epub 2011 Dec 1. J Am Chem Soc. 2011. PMID: 22081982

7

Nanoparticle layer deposition for highly controlled multilayer formation based on high- coverage monolayers of nanoparticles.

Liu Y, Williams MG, Miller TJ, Teplyakov AV. Liu Y, et al. Among authors: teplyakov av. Thin Solid Films. 2016 Jan 1;598:16-24. doi: 10.1016/j.tsf.2015.11.082. Thin Solid Films. 2016. PMID: 26726273 Free PMC article.

8

Silver Deposition onto Modified Silicon Substrates.

Duan Y, Rani S, Zhang Y, Ni C, Newberg JT, Teplyakov AV. Duan Y, et al. Among authors: teplyakov av. J Phys Chem C Nanomater Interfaces. 2017 Apr 6;121(13):7240-7247. doi: 10.1021/acs.jpcc.6b12896. Epub 2017 Mar 13. J Phys Chem C Nanomater Interfaces. 2017. PMID: 28652890 Free PMC article.

9

Formation of silica-supported platinum nanoparticles as a function of preparation conditions and boron impregnation.

Rani S, Byron C, Teplyakov AV. Rani S, et al. Among authors: teplyakov av. J Chem Phys. 2020 Apr 7;152(13):134701. doi: 10.1063/1.5142503. J Chem Phys. 2020. PMID: 32268738

10

The Effect of Surface Terminations on the Initial Stages of TiO₂ Deposition on Functionalized Silicon.

Parke T, Silva-Quinones D, Wang GT, Teplyakov AV. Parke T, et al. Among authors: teplyakov av. Chemphyschem. 2023 Apr 3;24(7):e202200724. doi: 10.1002/cphc.202200724. Epub 2023 Jan 10. Chemphyschem. 2023. PMID: 36516050

Save citations to file

Email citations

Send citations to clipboard

Add to Collections

Add to My Bibliography

Create a file for external citation management software

Your saved search

Your RSS Feed

My NCBI Filters

Text availability

Article attribute

Article type

Publication date

62 results

Search Page