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Oh H, Im T, Pyo J, Lee JS, Lee CS.Oh H, et al. Among authors: lee js, lee cs.Sci Rep. 2023 Mar 24;13(1):4819. doi: 10.1038/s41598-023-32095-5.Sci Rep. 2023.PMID: 36964278Free PMC article.
Im T, Oh H, Goh B, Kim J, Lee JS, Choi J, Lee CS.Im T, et al. Among authors: lee js, lee cs.Heliyon. 2024 Mar 28;10(7):e28689. doi: 10.1016/j.heliyon.2024.e28689. eCollection 2024 Apr 15.Heliyon. 2024.PMID: 38596138Free PMC article.
Pawar RC, Kang S, Park JH, Kim JH, Ahn S, Lee CS.Pawar RC, et al. Among authors: lee cs.Sci Rep. 2016 Aug 8;6:31147. doi: 10.1038/srep31147.Sci Rep. 2016.PMID: 27498979Free PMC article.
Choi D, Sonkaria S, Fox SJ, Poudel S, Kim SY, Kang S, Kim S, Verma C, Ahn SH, Lee CS, Khare V.Choi D, et al. Among authors: lee cs.Sci Rep. 2019 Dec 10;9(1):18721. doi: 10.1038/s41598-019-55103-z.Sci Rep. 2019.PMID: 31822722Free PMC article.
Kwon J, Park S, Haque MM, Kim YS, Lee CS.Kwon J, et al. Among authors: lee cs.J Nanosci Nanotechnol. 2012 Apr;12(4):3434-7. doi: 10.1166/jnn.2012.5638.J Nanosci Nanotechnol. 2012.PMID: 22849140
Park S, Kim KS, Roh JY, Jang GB, Ahn SH, Lee CS.Park S, et al. Among authors: lee cs.J Nanosci Nanotechnol. 2012 Apr;12(4):3376-9. doi: 10.1166/jnn.2012.5547.J Nanosci Nanotechnol. 2012.PMID: 22849127
Kim YH, Kim KS, Lee JW, Kim MS, Choi JO, Ahn SH, Lee CS.Kim YH, et al. Among authors: lee jw, lee cs.J Nanosci Nanotechnol. 2012 Apr;12(4):3478-82. doi: 10.1166/jnn.2012.5576.J Nanosci Nanotechnol. 2012.PMID: 22849150
Kang S , Jang J , Ahn SH , Lee CS .Kang S , et al. Among authors: lee cs.Dalton Trans. 2019 Feb 5;48(6):2170-2178. doi: 10.1039/c8dt04656e.Dalton Trans. 2019.PMID: 30672926
Kim J, Shin D, Son M, Lee CS.Kim J, et al. Among authors: lee cs.ACS Appl Mater Interfaces. 2023 Mar 15;15(10):13249-13257. doi: 10.1021/acsami.2c19151. Epub 2023 Mar 3.ACS Appl Mater Interfaces. 2023.PMID: 36867019
Kim MS, Chun DM, Choi JO, Lee JC, Kim YH, Kim KS, Lee CS, Ahn SH.Kim MS, et al. Among authors: lee jc, lee cs.J Nanosci Nanotechnol. 2012 Apr;12(4):3384-8. doi: 10.1166/jnn.2012.5548.J Nanosci Nanotechnol. 2012.PMID: 22849129