Control of wettability of molecularly thin liquid films by nanostructures.
Fukuzawa K, Deguchi T, Yamawaki Y, Itoh S, Muramatsu T, Zhang H.
Fukuzawa K, et al. Among authors: zhang h.
Langmuir. 2008 Mar 18;24(6):2921-8. doi: 10.1021/la703106s. Epub 2008 Feb 1.
Langmuir. 2008.
PMID: 18237215
A method of nanometer-scale patterning of a molecularly thin liquid film on a silicon substrate using the lyophobicity of the oxide nanostructures has recently been reported (Fukuzawa, K.; Deguchi, T.; Kawamura, J.; Mitsuya, Y.; Muramatsu, T.; Zhang, H. Appl. Phys. …
A method of nanometer-scale patterning of a molecularly thin liquid film on a silicon substrate using the lyophobicity of the oxide nanostru …