Remote Oxygen Scavenging of the Interfacial Oxide Layer in Ferroelectric Hafnium-Zirconium Oxide-Based Metal-Oxide-Semiconductor Structures.
Tasneem N, Kashyap H, Chae K, Park C, Lee PC, Lombardo SF, Afroze N, Tian M, Kumarasubramanian H, Hur J, Chen H, Chern W, Yu S, Bandaru P, Ravichandran J, Cho K, Kacher J, Kummel AC, Khan AI.
Tasneem N, et al. Among authors: afroze n.
ACS Appl Mater Interfaces. 2022 Sep 28;14(38):43897-43906. doi: 10.1021/acsami.2c11736. Epub 2022 Sep 19.
ACS Appl Mater Interfaces. 2022.
PMID: 36121320