Stable Subloop Behavior in Ferroelectric Si-Doped HfO2.
Lee K, Lee HJ, Lee TY, Lim HH, Song MS, Yoo HK, Suh DI, Lee JG, Zhu Z, Yoon A, MacDonald MR, Lei X, Park K, Park J, Lee JH, Chae SC.
Lee K, et al. Among authors: park k, park j.
ACS Appl Mater Interfaces. 2019 Oct 23;11(42):38929-38936. doi: 10.1021/acsami.9b12878. Epub 2019 Oct 11.
ACS Appl Mater Interfaces. 2019.
PMID: 31576734