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Miniaturization of CMOS.
Radamson HH, He X, Zhang Q, Liu J, Cui H, Xiang J, Kong Z, Xiong W, Li J, Gao J, Yang H, Gu S, Zhao X, Du Y, Yu J, Wang G. Radamson HH, et al. Among authors: liu j. Micromachines (Basel). 2019 Apr 30;10(5):293. doi: 10.3390/mi10050293. Micromachines (Basel). 2019. PMID: 31052223 Free PMC article. Review.
State of the Art and Future Perspectives in Advanced CMOS Technology.
Radamson HH, Zhu H, Wu Z, He X, Lin H, Liu J, Xiang J, Kong Z, Xiong W, Li J, Cui H, Gao J, Yang H, Du Y, Xu B, Li B, Zhao X, Yu J, Dong Y, Wang G. Radamson HH, et al. Among authors: liu j. Nanomaterials (Basel). 2020 Aug 7;10(8):1555. doi: 10.3390/nano10081555. Nanomaterials (Basel). 2020. PMID: 32784801 Free PMC article. Review.
Strain Modulation of Selectively and/or Globally Grown Ge Layers.
Du Y, Wang G, Miao Y, Xu B, Li B, Kong Z, Yu J, Zhao X, Lin H, Su J, Han J, Liu J, Dong Y, Wang W, Radamson HH. Du Y, et al. Among authors: liu j. Nanomaterials (Basel). 2021 May 28;11(6):1421. doi: 10.3390/nano11061421. Nanomaterials (Basel). 2021. PMID: 34071167 Free PMC article.
A Polarization-Switching, Charge-Trapping, Modulated Arithmetic Logic Unit for In-Memory Computing Based on Ferroelectric Fin Field-Effect Transistors.
Zhang Z, Luo Y, Cui Y, Yang H, Zhang Q, Xu G, Wu Z, Xiang J, Liu Q, Yin H, Mao S, Wang X, Li J, Zhang Y, Luo Q, Gao J, Xiong W, Liu J, Li Y, Li J, Luo J, Wang W. Zhang Z, et al. Among authors: liu j, liu q. ACS Appl Mater Interfaces. 2022 Feb 9;14(5):6967-6976. doi: 10.1021/acsami.1c20189. Epub 2022 Jan 25. ACS Appl Mater Interfaces. 2022. PMID: 35076195
Demonstration of Germanium Vertical Gate-All-Around Field-Effect Transistors Featured by Self-Aligned High-κ Metal Gates with Record High Performance.
Xie L, Zhu H, Zhang Y, Ai X, Li J, Wang G, Liu J, Du A, Yang H, Yin X, Huang W, Li C, Li Y, Wang Q, Lu S, Kong Z, Xiang J, Du Y, Luo J, Li J, Radamson HH, Wang W, Ye T. Xie L, et al. Among authors: liu j. ACS Nano. 2023 Nov 28;17(22):22259-22267. doi: 10.1021/acsnano.3c02518. Epub 2023 Oct 12. ACS Nano. 2023. PMID: 37823534
Interface Investigation on SiGe/Si Multilayer Structures: Influence of Different Epitaxial Process Conditions.
Kong Z, Song Y, Wang H, Liu X, Wang X, Liu J, Li B, Su J, Tan X, Luan Q, Lin H, Ren Y, Zhang Y, Liu J, Li J, Du A, Radamson HH, Zhao C, Ye T, Wang G. Kong Z, et al. Among authors: liu j, liu x. ACS Appl Mater Interfaces. 2023 Dec 6;15(48):56567-56574. doi: 10.1021/acsami.3c14168. Epub 2023 Nov 21. ACS Appl Mater Interfaces. 2023. PMID: 37988059
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