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Atomic Layer Deposition of Layered Boron Nitride for Large-Area 2D Electronics.
ACS Appl Mater Interfaces. 2020 Aug 12;12(32):36688-36694. doi: 10.1021/acsami.0c07548. Epub 2020 Jul 29.
ACS Appl Mater Interfaces. 2020.
PMID: 32667778
Low Temperature Thermal Atomic Layer Deposition of Aluminum Nitride Using Hydrazine as the Nitrogen Source.
Jung YC, Hwang SM, Le DN, Kondusamy ALN, Mohan J, Kim SW, Kim JH, Lucero AT, Ravichandran A, Kim HS, Kim SJ, Choi R, Ahn J, Alvarez D, Spiegelman J, Kim J.
Jung YC, et al.
Materials (Basel). 2020 Jul 31;13(15):3387. doi: 10.3390/ma13153387.
Materials (Basel). 2020.
PMID: 32751836
Free PMC article.
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Sub-10 nm Tunable Hybrid Dielectric Engineering on MoS2 for Two-Dimensional Material-Based Devices.
Cheng L, Lee J, Zhu H, Ravichandran AV, Wang Q, Lucero AT, Kim MJ, Wallace RM, Colombo L, Kim J.
Cheng L, et al. Among authors: ravichandran av.
ACS Nano. 2017 Oct 24;11(10):10243-10252. doi: 10.1021/acsnano.7b04813. Epub 2017 Aug 30.
ACS Nano. 2017.
PMID: 28832118
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