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Trimethylaluminum and Oxygen Atomic Layer Deposition on Hydroxyl-Free Cu(111).
Gharachorlou A, Detwiler MD, Gu XK, Mayr L, Klötzer B, Greeley J, Reifenberger RG, Delgass WN, Ribeiro FH, Zemlyanov DY. Gharachorlou A, et al. Among authors: greeley j. ACS Appl Mater Interfaces. 2015 Aug 5;7(30):16428-39. doi: 10.1021/acsami.5b03598. Epub 2015 Jul 23. ACS Appl Mater Interfaces. 2015. PMID: 26158796 Free PMC article.
Stabilization of copper catalysts for liquid-phase reactions by atomic layer deposition.
O'Neill BJ, Jackson DH, Crisci AJ, Farberow CA, Shi F, Alba-Rubio AC, Lu J, Dietrich PJ, Gu X, Marshall CL, Stair PC, Elam JW, Miller JT, Ribeiro FH, Voyles PM, Greeley J, Mavrikakis M, Scott SL, Kuech TF, Dumesic JA. O'Neill BJ, et al. Among authors: greeley j. Angew Chem Int Ed Engl. 2013 Dec 16;52(51):13808-12. doi: 10.1002/anie.201308245. Epub 2013 Nov 26. Angew Chem Int Ed Engl. 2013. PMID: 24282166
Defect evolution in graphene upon electrochemical lithiation.
Jaber-Ansari L, Puntambekar KP, Tavassol H, Yildirim H, Kinaci A, Kumar R, Saldaña SJ, Gewirth AA, Greeley JP, Chan MK, Hersam MC. Jaber-Ansari L, et al. Among authors: greeley jp. ACS Appl Mater Interfaces. 2014 Oct 22;6(20):17626-36. doi: 10.1021/am503715g. Epub 2014 Oct 10. ACS Appl Mater Interfaces. 2014. PMID: 25265029
125 results