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Aligned silicon nanofins via the directed self-assembly of PS-b-P4VP block copolymer and metal oxide enhanced pattern transfer.
Nanoscale. 2015 Apr 21;7(15):6712-21. doi: 10.1039/c4nr07679f.
Nanoscale. 2015.
PMID: 25798892
Free article.
Fabrication of Si and Ge nanoarrays through graphoepitaxial directed hardmask block copolymer self-assembly.
Gangnaik AS, Ghoshal T, Georgiev YM, Morris MA, Holmes JD.
Gangnaik AS, et al.
J Colloid Interface Sci. 2018 Dec 1;531:533-543. doi: 10.1016/j.jcis.2018.06.018. Epub 2018 Jun 30.
J Colloid Interface Sci. 2018.
PMID: 30055448
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Solvent vapor annealing of block copolymers in confined topographies: commensurability considerations for nanolithography.
Cummins C, Kelly RA, Gangnaik A, Georgiev YM, Petkov N, Holmes JD, Morris MA.
Cummins C, et al. Among authors: gangnaik a.
Macromol Rapid Commun. 2015 Apr;36(8):762-7. doi: 10.1002/marc.201400722. Epub 2015 Feb 19.
Macromol Rapid Commun. 2015.
PMID: 25704307
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Organo-arsenic molecular layers on silicon for high-density doping.
O'Connell J, Verni GA, Gangnaik A, Shayesteh M, Long B, Georgiev YM, Petkov N, McGlacken GP, Morris MA, Duffy R, Holmes JD.
O'Connell J, et al. Among authors: gangnaik a.
ACS Appl Mater Interfaces. 2015 Jul 22;7(28):15514-21. doi: 10.1021/acsami.5b03768. Epub 2015 Jul 7.
ACS Appl Mater Interfaces. 2015.
PMID: 26111734
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