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A sensitive EUV Schwarzschild microscope for plasma studies with sub-micrometer resolution.
Zastrau U, Rödel C, Nakatsutsumi M, Feigl T, Appel K, Chen B, Döppner T, Fennel T, Fiedler T, Fletcher LB, Förster E, Gamboa E, Gericke DO, Göde S, Grote-Fortmann C, Hilbert V, Kazak L, Laarmann T, Lee HJ, Mabey P, Martinez F, Meiwes-Broer KH, Pauer H, Perske M, Przystawik A, Roling S, Skruszewicz S, Shihab M, Tiggesbäumker J, Toleikis S, Wünsche M, Zacharias H, Glenzer SH, Gregori G. Zastrau U, et al. Among authors: forster e. Rev Sci Instrum. 2018 Feb;89(2):023703. doi: 10.1063/1.5007950. Rev Sci Instrum. 2018. PMID: 29495844
K-shell spectroscopy of silicon ions as diagnostic for high electric fields.
Loetzsch R, Jäckel O, Höfer S, Kämpfer T, Polz J, Uschmann I, Kaluza MC, Förster E, Stambulchik E, Kroupp E, Maron Y. Loetzsch R, et al. Among authors: forster e. Rev Sci Instrum. 2012 Nov;83(11):113507. doi: 10.1063/1.4767452. Rev Sci Instrum. 2012. PMID: 23206062
High-precision x-ray polarimetry.
Marx B, Schulze KS, Uschmann I, Kämpfer T, Lötzsch R, Wehrhan O, Wagner W, Detlefs C, Roth T, Härtwig J, Förster E, Stöhlker T, Paulus GG. Marx B, et al. Among authors: forster e. Phys Rev Lett. 2013 Jun 21;110(25):254801. doi: 10.1103/PhysRevLett.110.254801. Epub 2013 Jun 21. Phys Rev Lett. 2013. PMID: 23829740
562 results