100 nm period grating by high-index phase-mask immersion lithography.
Bourgin Y, Jourlin Y, Parriaux O, Talneau A, Tonchev S, Veillas C, Karvinen P, Passilly N, Md Zain AR, De La Rue RM, Van Erps J, Troadec D.
Bourgin Y, et al. Among authors: md zain ar.
Opt Express. 2010 May 10;18(10):10557-66. doi: 10.1364/OE.18.010557.
Opt Express. 2010.
PMID: 20588908
Free article.