100 nm period grating by high-index phase-mask immersion lithography.
Bourgin Y, Jourlin Y, Parriaux O, Talneau A, Tonchev S, Veillas C, Karvinen P, Passilly N, Md Zain AR, De La Rue RM, Van Erps J, Troadec D.
Bourgin Y, et al. Among authors: de la rue rm.
Opt Express. 2010 May 10;18(10):10557-66. doi: 10.1364/OE.18.010557.
Opt Express. 2010.
PMID: 20588908
Free article.