Electrical doping of semiconductors is a revolutionary development that enabled many electronic and optoelectronic technologies. While doping of many inorganic and organic semiconductors has been well-established, controlled electrical doping of metal halide perovskites is yet to be demonstrated. In this work, we achieve efficient n- and p-type electrical doping of metal halide perovskites by co-evaporating the perovskite precursors alongside organic dopant molecules. We demonstrate that the Fermi level can be shifted by up to 500 meV towards the conduction band and by up to 400 meV towards the valence band by n- and p-doping, respectively, which increases the conductivity of the films. The doped layers were employed in PN and NP diodes, showing opposing trends in rectification. Demonstrating controlled electrical doping by a scalable, industrially relevant deposition method opens the route to developing perovskite devices beyond solar cells, such as thermoelectrics or complementary logic. This article is protected by copyright. All rights reserved.
Keywords: Metal Halide Perovskites; PN junctions; electrical doping; energetics.
This article is protected by copyright. All rights reserved.