Effects of three disinfection solutions on residual monomers released from resin nanoceramic CAD/CAM blocks

Serdar Akarsu; Samet Atasoy; Merve Arıkan; Bengisu Koca; Sena Nur Yiğin

doi:10.1016/j.heliyon.2024.e24369

Effects of three disinfection solutions on residual monomers released from resin nanoceramic CAD/CAM blocks

Heliyon. 2024 Jan 19;10(3):e24369. doi: 10.1016/j.heliyon.2024.e24369. eCollection 2024 Feb 15.

Authors

Serdar Akarsu¹, Samet Atasoy¹, Merve Arıkan¹, Bengisu Koca¹, Sena Nur Yiğin¹

Affiliation

¹ Ordu University, Faculty of Dentistry, Department of Restorative Dentistry, Turkey.

Abstract

The aim of this study was to evaluate the effects of three disinfection solutions on the amount of monomers released from resin nanoceramic CAD/CAM blocks using high performance liquid chromatography (HPLC). Forty resin nanoceramic CAD/CAM (Cerasmart, GC, Japan) samples (12x14 × 2 mm) were divided into four groups; each group was disinfected using one of four solutions (Group 1: no disinfectant; Group 2: 70 % ethanol; Group 3: 2 % glutaraldehyde; and Group 4: 1 % sodium hypochlorite) for 5 min. Analysis of residual monomers (UDMA and Bis-EMA) amounts was performed using an HPLC instrument (Dionex Ultimate 3000, Thermo Fisher Scientific). After 30 days, the amounts of monomers found were as follows: 14.54 ppm for Group 1; 9.28 ppm for Group 2; 10.60 ppm for Group 3; and 2.76 ppm for Group 4 (the smallest monomer amount) (p < 0.001). Disinfection of indirect restorations prior to cementation can reduce the amount of residual monomers remaining from resin nanoceramic CAD/CAM blocks.

Keywords: HPLC; Residual monomer; Resin nanoceramic CAD/CAM block.