Photocrosslinkable Cellulose Derivatives for the Manufacturing of All-Cellulose-Based Architectures

Polymers (Basel). 2023 Dec 19;16(1):9. doi: 10.3390/polym16010009.

Abstract

Replacing petroleum-based polymers with biopolymers such as polysaccharides is essential for protecting our environment by saving fossil resources. A research field that can benefit from the application of more sustainable and renewable materials is photochemistry. Therefore, cellulose-based photoresists that could be photocrosslinked via UV irradiation (λ = 254 nm and λ = 365 nm) were developed. These biogenic polymers enable the manufacturing of sustainable coatings, even with imprinted microstructures, and cellulose-based bulk materials. Thus, herein, cellulose was functionalized with organic compounds containing carbon double bonds to introduce photocrosslinkable side groups directly onto the cellulose backbone. Therefore, unsaturated anhydrides such as methacrylic acid anhydride and unsaturated and polyunsaturated carboxylic acids such as linoleic acid were utilized. Additionally, these cellulose derivatives were modified with acetate or tosylate groups to generate cellulose-based polymers, which are soluble in organic solvents, making them suitable for multiple processing methods, such as casting, printing and coating. The photocurable resist was basically composed of the UV-crosslinkable biopolymer, an appropriate solvent and, if necessary, a photoinitiator. Moreover, these bio-based photoresists were UV-crosslinkable in the liquid and solid states after the removal of the solvent. Further, the manufactured cellulose-based architectures, even the bulk structures, could be entirely regenerated into pure cellulose devices via a sodium methoxide treatment.

Keywords: UV curing; bio-based photoresist; biomaterial; cellulose derivative; cellulose regeneration; esterification; photocrosslinking.

Grants and funding

The financial support from the German Science Foundation (DFG) for funding this work within the priority program “Tailored Disorder—A science- and engineering-based approach to materials design for advanced photonic applications” (SPP-1839) is gratefully acknowledged.