Complex multilayer film structures were fabricated through a custom-built angular DC magnetron co-sputtering system. In this system, separate Cu, Al, and brass (Cu + Zn) targets were mounted on three magnetron guns, working in conjunction with a rotating substrate. This study aimed to compare the properties of films with intricate structures, which were sputtered onto glass slides and polypropylene substrates. The sputtering process was optimized using a Box-Behnken design, considering three variable operating conditions: substrate rotation speed, sputtering time, and sputtering voltage. The Analysis of Variance (ANOVA) results for film thickness and roughness, sputtered with three different materials onto glass slides and polypropylene (PP) substrates, indicated that all three independent variables significantly influenced the optimum response, with P-values less than 0.05 (<α = 0.05). The optimal conditions for maximizing the thickness and roughness of the sputtered film on PP substrates differed from those obtained for the thin-film properties of the sputtered film on glass slide substrates. Top-view images of the surface morphology revealed a dense and granular structure for the film deposited on the glass slide, whereas some grooves between the grains and fractures were observed in the film on the PP substrate. Additionally, it was evident that these sputtered multilayer films exhibited a complex structure, as reflected in the uniform and homogeneous distribution of Cu, Al, and Zn atoms on both glass slides and PP substrates.
Keywords: Angular sputtering; Co-sputtering; Magnetron sputtering; Multilayer sputtering.
© 2023 The Authors.