Low-Vacuum Catalyst-Free Physical Vapor Deposition and Magnetotransport Properties of Ultrathin Bi2Se3 Nanoribbons

Raitis Sondors; Kiryl Niherysh; Jana Andzane; Xavier Palermo; Thilo Bauch; Floriana Lombardi; Donats Erts

doi:10.3390/nano13172484

Low-Vacuum Catalyst-Free Physical Vapor Deposition and Magnetotransport Properties of Ultrathin Bi₂Se₃ Nanoribbons

Nanomaterials (Basel). 2023 Sep 3;13(17):2484. doi: 10.3390/nano13172484.

Authors

Raitis Sondors¹, Kiryl Niherysh¹, Jana Andzane¹, Xavier Palermo², Thilo Bauch², Floriana Lombardi², Donats Erts^{1

3}

Affiliations

¹ Institute of Chemical Physics, University of Latvia, LV-1586 Riga, Latvia.
² Quantum Device Physics Laboratory, Department of Microtechnology and Nanoscience, Chalmers University of Technology, 41296 Gothenburg, Sweden.
³ Faculty of Chemistry, University of Latvia, LV-1586 Riga, Latvia.

Abstract

In this work, a simple catalyst-free physical vapor deposition method is optimized by adjusting source material pressure and evaporation time for the reliable obtaining of freestanding nanoribbons with thicknesses below 15 nm. The optimum synthesis temperature, time and pressure were determined for an increased yield of ultrathin Bi₂Se₃ nanoribbons with thicknesses of 8-15 nm. Physical and electrical characterization of the synthesized Bi₂Se₃ nanoribbons with thicknesses below 15 nm revealed no degradation of properties of the nanoribbons, as well as the absence of the contribution of trivial bulk charge carriers to the total conductance of the nanoribbons.

Keywords: bismuth selenide; bulk-free topological insulator; catalyst-free physical vapor deposition; magnetotransport properties; ultrathin nanoribbons.

Abstract

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