Expression of concern: Synthesis of MA POSS-PMMA as an intraocular lens material with high light transmittance and good cytocompatibility

Bailiang Wang; Quankui Lin; Chenghui Shen; Yuemei Han; Junmei Tang; Hao Chen

doi:10.1039/d3ra90083e

Expression of concern: Synthesis of MA POSS-PMMA as an intraocular lens material with high light transmittance and good cytocompatibility

RSC Adv. 2023 Sep 5;13(38):26544. doi: 10.1039/d3ra90083e. eCollection 2023 Sep 4.

Authors

Bailiang Wang^{1

2}, Quankui Lin^{1

2}, Chenghui Shen², Yuemei Han¹, Junmei Tang¹, Hao Chen^{1

2}

Affiliations

¹ School of Ophthalmology & Optometry, Eye Hospital, Wenzhou Medical University Wenzhou 325027 China lqk97531@126.com Chenhao823@mail.eye.ac.cn +86 577 88067962.
² Wenzhou Institute of Biomaterials and Engineering Wenzhou 32500 China.

Abstract

Expression of concern for 'Synthesis of MA POSS-PMMA as an intraocular lens material with high light transmittance and good cytocompatibility' by Bailiang Wang et al., RSC Adv., 2014, 4, 52959-52966, https://doi.org/10.1039/C4RA08060B.

Publication types

Expression of Concern