This study explores the potential of integrating thin-film technology in the design of new and effective electromagnetic interference (EMI) shielding and conductive materials for textiles and wearables. This application is of particular interest to the textile industry as it can bring new functionalities to wearables and protect humans from prolonged exposure to EM radiation. Three different thin films of pure Ti, pure Cu, and Ti-doped with Cu prepared by magnetron sputtering were used to functionalize textile knits based on cotton (code 39F) and lyocell fibers (62I). The films displayed different crystalline structures, morphologies, and topographies, which depended on their chemical compositions. The shielding effectiveness (SE) of the functionalized knits against EMI was evaluated in the frequency range of 2-8 GHz. Also, the electrical response under stress was assessed since the electrical conductivity is closely related to the EMI shielding effectiveness. The results demonstrate the feasibility of using a thin conductive layer based on Cu or Ti-Cu to improve the shield textiles with great adhesion and low thickness, providing an interesting path to improve shielding efficiency for EMI without modifying the flexibility of the textiles.
Keywords: EMI shielding; Ti−Cu thin films; electromechanical response; materials design; textile functionalization.