Metal-insulator-transition (MIT) of VO2 has attracted strong attention as a potential phenomenon to be utilized in nanostructured devices. Dynamics of MIT phase transition determines the feasibility of VO2 material properties in various applications, for example, photonic components, sensors, MEMS actuators, and neuromorphic computing. However, conventional interface strain model predicts the MIT effect accurately for bulk, but fairly for the thin films, and thus, a new model is needed. It was found that the VO2 thin film-substrate interface plays a crucial role in determining transition dynamics properties. In VO2 thin films on different substrates, coexistence of insulator-state polymorph phases, dislocations, and a few unit cell reconstruction layer form an interface structure minimizing strain energy by the increase of structural complexity. As a consequence, MIT temperature and hysteresis of structure increased as the transition enthalpy of the interface increased. Thus, the process does not obey the conventional Clausius-Clapeyron law anymore. A new model is proposed for residual strain energy potentials by implementing a modified Cauchy strain. Experimental results confirm that the MIT effect in constrained VO2 thin films is induced through the Peierls mechanism. The developed model provides tools for strain engineering in the atomic scale for crystal potential distortion effects in nanotechnology, such as topological quantum devices.
© 2023 The Authors. Published by American Chemical Society.