Suppression of pyrite oxidation by co-depositing bio-inspired PropS-SH-tannic acid coatings for the source control acid mine drainage

Sci Total Environ. 2023 Mar 1:862:160857. doi: 10.1016/j.scitotenv.2022.160857. Epub 2022 Dec 12.

Abstract

In previous works, both tannic acid (TA) and organosilane-based passivators have been proven to possess good inhibition effects on pyrite oxidation, which could effectively prevent acid mine drainage (AMD) generation at the source. However, the hydrophilicity of TA passivation film and the complex coating process of organosilane-based passivators (high temperature conditions were required during the process carried out) may limit their further practical use. Therefore, to achieve the purpose of better coating treatment of pyrite under mild conditions, TA and γ-mercaptopropyltrimethoxysilane (PropS-SH) were introduced to synergistically passivate pyrite in this work. Electrochemistry tests and chemical leaching experiments both confirmed that PropS-SH-TA coated pyrite had better oxidation resistance than raw pyrite and single PropS-SH or TA coated pyrite. Additionally, the analyses of scanning electron microscopy (SEM) measurements and static water contact angle tests demonstrated that a scaly coating was formed on PropS-SH-TA coated pyrite surface, which may be the reason for the significant improvement of its surface hydrophobicity. Finally, the study on the film-forming mechanism of PropS-SH-TA composite passivator displayed that the benzoquinone derivatives formed by TA could copolymerize with PropS-SH through Michael addition or Schiff base reaction, which constructed a dense hydrophobic film on pyrite surface. The newly formed composite film could provide a better oxidation barrier for pyrite based on TA passivation film.

Keywords: Acid mine drainage; Co-depositing; Passivation; PropS-SH-tannic acid coatings; Pyrite oxidation.

MeSH terms

  • Iron* / chemistry
  • Organosilicon Compounds*
  • Oxidation-Reduction
  • Sulfides / chemistry

Substances

  • pyrite
  • Iron
  • Sulfides
  • Organosilicon Compounds