Effect of Annealing and Thickness of Co40Fe40Yb20 Thin Films on Various Physical Properties on a Glass Substrate

Wen-Jen Liu; Yung-Huang Chang; Chia-Chin Chiang; Chi-Lon Fern; Yuan-Tsung Chen; Ying-Hsuan Chen; Hao-Wen Liao; Te-Ho Wu; Shih-Hung Lin; Ko-Wei Lin; Po-Wei Chi

doi:10.3390/ma15238509

Effect of Annealing and Thickness of Co₄₀Fe₄₀Yb₂₀ Thin Films on Various Physical Properties on a Glass Substrate

Materials (Basel). 2022 Nov 29;15(23):8509. doi: 10.3390/ma15238509.

Authors

Wen-Jen Liu¹, Yung-Huang Chang², Chia-Chin Chiang³, Chi-Lon Fern⁴, Yuan-Tsung Chen⁵, Ying-Hsuan Chen⁵, Hao-Wen Liao⁵, Te-Ho Wu⁵, Shih-Hung Lin⁶, Ko-Wei Lin⁴, Po-Wei Chi⁷

Affiliations

¹ Department of Materials Science and Engineering, I-Shou University, Kaohsiung 84001, Taiwan.
² Bachelor Program in Interdisciplinary Studies, National Yunlin University of Science and Technology, 123 University Road, Section 3, Douliou 64002, Taiwan.
³ Department of Mechanical Engineering, National Kaohsiung University of Science and Technology, 415 Chien Kung Road, Kaohsiung 80778, Taiwan.
⁴ Department of Materials Science and Engineering, National Chung Hsing University, Taichung 40227, Taiwan.
⁵ Graduate School of Materials Science, National Yunlin University of Science and Technology, 123 University Road, Section 3, Douliou 64002, Taiwan.
⁶ Department of Electronic Engineering, National Yunlin University of Science and Technology, 123 University Road, Section 3, Douliou 64002, Taiwan.
⁷ Institute of Physics, Academia Sinica, Nankang, Taipei 11529, Taiwan.

Abstract

The aim of this work is to investigate the effect of annealing and thickness on various physical properties in Co₄₀Fe₄₀Yb₂₀ thin films. X-ray diffraction (XRD) was used to determine the amorphous structure of Co₄₀Fe₄₀Yb₂₀ films. The maximum surface energy of 40 nm thin films at 300 °C is 34.54 mJ/mm². The transmittance and resistivity decreased significantly as annealing temperatures and thickness increased. At all conditions, the 10 nm film had the highest hardness. The average hardness decreased as thickness increased, as predicted by the Hall-Petch effect. The highest low-frequency alternative-current magnetic susceptibility (χ_ac) value was discovered when the film was annealed at 200 °C with 50 nm, and the optimal resonance frequency (ƒ_res) was in the low frequency range, indicating that the film has good applicability in the low frequency range. At annealed 200 °C and 50 nm, the maximum saturation magnetization (Ms) was discovered. Thermal disturbance caused the Ms to decrease when the temperature was raised to 300 °C. The optimum process conditions determined in this study are 200 °C and 50 nm, with the highest Ms, χ_ac, strong adhesion, and low resistivity, which are suitable for magnetic applications, based on magnetic properties and surface energy.

Keywords: X-ray diffraction (XRD); adhesion; electrical properties; low-frequency alternating current magnetic susceptibility (χac); nanomechanical property; transmittance.

Abstract

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