Highly Sensitive Plasmonic Structures Utilizing a Silicon Dioxide Overlayer

Nanomaterials (Basel). 2022 Sep 6;12(18):3090. doi: 10.3390/nano12183090.

Abstract

In this paper, simple and highly sensitive plasmonic structures are analyzed theoretically and experimentally. A structure comprising a glass substrate with a gold layer, two adhesion layers of chromium, and a silicon dioxide overlayer is employed in liquid analyte sensing. The sensing properties of two structures with distinct protective layer thicknesses are derived based on a wavelength interrogation method. Spectral reflectance responses in the Kretschmann configuration with a coupling BK7 prism are presented, using the thicknesses of individual layers obtained by a method of spectral ellipsometry. In the measured spectral reflectance, a pronounced dip is resolved, which is strongly red-shifted as the refractive index (RI) of the analyte increases. Consequently, a sensitivity of 15,785 nm per RI unit (RIU) and a figure of merit (FOM) of 37.9 RIU-1 are reached for the silicon dioxide overlayer thickness of 147.5 nm. These results are in agreement with the theoretical ones, confirming that both the sensitivity and FOM can be enhanced using a thicker silicon dioxide overlayer. The designed structures prove to be advantageous as their durable design ensures the repeatability of measurement and extends their employment compared to regularly used structures for aqueous analyte sensing.

Keywords: Kretschmann configuration; aqueous analyte sensing; reflectance; silicon dioxide overlayer; surface plasmon resonance.

Grants and funding

This research was supported by ERDF/ESF project New Composite Materials for Environmental Applications (No. CZ.02.1.01/0.0/0.0/17_048/0007399), by the student grant system through project SP2022/25, by the Slovak National Grant Agency under the project VEGA 1/0363/22 and the Slovak Research and Development Agency under the project No. APVV-20-0264, and by the institutional (ISI, Brno) support RVO:68081731.