Quantum dot patterning by direct photolithography

Nat Nanotechnol. 2022 Sep;17(9):906-907. doi: 10.1038/s41565-022-01187-0.

Junpeng Fan^{1

2}, Lei Qian^{3

4}

¹ Division of Functional Materials and Nanodevices, Ningbo Institute of Materials Technology and Engineering, Chinese Academy of Sciences, Ningbo, China.
² Laboratory of Advanced Nano-Optoelectronic Materials and Devices, Qianwan Institute of CNITECH, Ningbo, China.
³ Division of Functional Materials and Nanodevices, Ningbo Institute of Materials Technology and Engineering, Chinese Academy of Sciences, Ningbo, China. qianlei@nimte.ac.cn.
⁴ Laboratory of Advanced Nano-Optoelectronic Materials and Devices, Qianwan Institute of CNITECH, Ningbo, China. qianlei@nimte.ac.cn.

No abstract available

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