The fabrication of dual-mode patterns in the same region of a material is a promising approach for high-density information storage, new anti-counterfeiting technologies, and highly secure encryption. However, dual-mode patterns are difficult to achieve because the two patterns in one material may interfere with each other during fabrication and usage. The development of noninterfering dual-mode patterns requires new materials and patterning techniques. Herein, a novel orthogonal photopatterning technique is reported for the fabrication of noninterfering dual-mode patterns on an azopolymer P1. P1 is a unique material that exhibits both photoinduced reversible solid-to-liquid transitions and good stretchability. In the first step of orthogonal photopatterning, patterned photonic structures are fabricated on a P1 film via masked nanoimprinting controlled by photoinduced reversible solid-to-liquid transitions. In the second step, the P1 film is stretched and irradiated with polarized light through a photomask, which generates a chromatic polarization pattern. In particular, the photonic structures and chromatic polarization in the dual-mode pattern are noninterfering. Another feature of dual-mode patterns is that they are rewritable via photo-, thermal, or solution reprocessing, which are useful for recycling and reprogramming. This study opens an avenue for the development of novel materials and techniques for photopatterning.
Keywords: azobenzene; chromatic polarization; lithography; photonic structures; photoresponsive polymers; structural color.
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