This paper presents concept, optical design, and the implementation of a novel, to the best of our knowledge, lithographic exposure tool for the fabrication of rotationally symmetric meso- and microscale optical structures using a variable ring-shaped light distribution. Compared to the conventional lithographic technique of direct writing in Cartesian coordinates, which is intrinsically suboptimal for the fabrication of rotationally symmetric optical structures, this approach allows for fast exposure and avoids disturbing stitching effects. The diameter of the exposure ring varies between 1.6 and 6.5 mm, and the ring width measures ∼75µm full width at half-maximum for all diameters. The basic capabilities of the exposure tool are demonstrated by the fabrication of exemplary meso- and microscale structures such as diffractive axicon elements, phase rings, Fresnel zone plates and zone plate arrays.