Correction to "Sub-5 nm Lithography with Single GeV Heavy Ions Using Inorganic Resist"
Nano Lett
.
2022 Mar 23;22(6):2586-2587.
doi: 10.1021/acs.nanolett.2c00588.
Epub 2022 Mar 14.
Authors
Qing Liu
,
Jing Zhao
,
Jinlong Guo
,
Ruqun Wu
,
Wenjing Liu
,
Yiqin Chen
,
Guanghua Du
,
Huigao Duan
PMID:
35285644
DOI:
10.1021/acs.nanolett.2c00588
No abstract available
Publication types
Published Erratum