In this paper, we present a hybrid semiconductor structure for biosensing applications that features the co-integration of nanoelectromechanical systems with the well-known metal oxide semiconductor technology. The proposed structure features an MOSFET as a readout element, and a doubly clamped beam that is isolated from the substrate by a thin air gap, as well as by a tunnel oxide layer. The beam structure is functionalised by a thin layer of biotargets, and the main aim is to detect a particular set of biomolecules, such as enzymes, bacteria, viruses, and DNA/RNA chains, among others. In here, a three-dimensional finite element analysis is performed in order to study the behaviour of the functionalised, doubly clamped beam. Preliminary results for the fabrication and characterisation processes show good agreement between the simulated and measured characteristics.
Keywords: NEMS/MEMS; biosensors; fabrication process; hybrid semiconductor structure; numerical analysis.