Molybdenum disulfide (MoS2) was grown on a laser-processed periodic-hole sapphire substrate through chemical vapor deposition. The main purpose was to investigate the mechanism of MoS2 growth in substrate with a periodic structure. By controlling the amount and position of the precursor, adjusting the growth temperature and time, and setting the flow rate of argon gas, MoS2 grew in the region of the periodic holes. A series of various growth layer analyses of MoS2 were then confirmed by Raman spectroscopy, photoluminescence spectroscopy, and atomic force microscopy. Finally, the growth mechanism was studied by transmission electron microscopy (TEM). The experimental results show that in the appropriate environment, MoS2 can be successfully grown on substrate with periodic holes, and the number of growth layers can be determined through measurements. By observing the growth mechanism, composition analysis, and selected area electron diffraction diagram by TEM, we comprehensively understand the growth phenomenon. The results of this research can serve as a reference for the large-scale periodic growth of MoS2. The production of periodic structures by laser drilling is advantageous, as it is relatively simpler than other methods.
Keywords: Molybdenum disulfide (MoS2); chemical vapor deposition; growth mechanism of MoS2; periodic growth of MoS2.