Influence of the Microstructure and Optical Constants on Plasmonic Properties of Copper Nanolayers

Materials (Basel). 2021 Nov 29;14(23):7292. doi: 10.3390/ma14237292.

Abstract

Copper layers with thicknesses of 12, 25, and 35 nm were thermally evaporated on silicon substrates (Si(100)) with two different deposition rates 0.5 and 5.0 Å/s. The microstructure of produced coatings was studied using atomic force microscopy (AFM) and powder X-ray diffractometer (XRD). Ellipsometric measurements were used to determine the effective dielectric functions <ε˜> as well as the quality indicators of the localized surface plasmon (LSP) and the surface plasmon polariton (SPP). The composition and purity of the produced films were analysed using X-ray photoelectron spectroscopy (XPS).

Keywords: microstructure; optical properties; thin copper layers.