Chemical Vapor Deposition of Ionic Liquids for the Fabrication of Ionogel Films and Patterns

Martin Obst; Giel Arnauts; Alexander John Cruz; Maider Calderon Gonzalez; Kristof Marcoen; Tom Hauffman; Rob Ameloot

doi:10.1002/anie.202110022

Chemical Vapor Deposition of Ionic Liquids for the Fabrication of Ionogel Films and Patterns

Angew Chem Int Ed Engl. 2021 Dec 1;60(49):25668-25673. doi: 10.1002/anie.202110022. Epub 2021 Oct 1.

Authors

Martin Obst¹, Giel Arnauts¹, Alexander John Cruz^{1

2}, Maider Calderon Gonzalez¹, Kristof Marcoen², Tom Hauffman², Rob Ameloot¹

Affiliations

¹ Centre for Membrane Separations, Adsorption, Catalysis, and Spectroscopy for Sustainable Solutions, KU Leuven, Leuven, Belgium.
² Research Group of Electrochemical and Surface Engineering, Vrije Universiteit Brussel, Brussels, Belgium.

PMID: 34478224
DOI: 10.1002/anie.202110022

Abstract

Film deposition and high-resolution patterning of ionic liquids (ILs) remain a challenge, despite a broad range of applications that would benefit from this type of processing. Here, we demonstrate for the first time the chemical vapor deposition (CVD) of ILs. The IL-CVD method is based on the formation of a non-volatile IL through the reaction of two vaporized precursors. Ionogel micropatterns can be easily obtained via the combination of IL-CVD and standard photolithography, and the resulting microdrop arrays can be used as microreactors. The IL-CVD approach will facilitate leveraging the properties of ILs in a range of applications and microfabricated devices.

Keywords: chemical vapor deposition; ionic liquid; ionogel; micropattern; photolitography.

Abstract

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